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磁控濺射卷繞式鍍膜機
發(fā)布時間：2022-11-03
瀏覽次數(shù)：421
磁控濺射卷繞式鍍膜機真空度解決方案
磁控濺射卷繞式鍍膜機在運行過程中，因為產(chǎn)生的熱量使薄膜產(chǎn)生多種氣體，這些氣體腔體真空度下降，對薄膜鍍膜產(chǎn)生影響，造成不良。根據(jù)這個我公司在薄膜鍍膜生產(chǎn)經(jīng)驗,做了解決技術方案,解除氣體,改善真空度,達到要求的良品.
■. 設備詳細規(guī)格
|
Chamber |
unit |
Specification |
Remark |
|
|
Rewind Chamber |
Base Pressure |
mbar |
≤ 7 × 10-6 |
|
|
Film Winding |
? |
50 ~ 200 |
||
|
Tension range |
N |
70 ~ 300N |
||
|
Max. roll diameter |
mm |
900 |
||
|
Process Chamber |
Base Pressure |
mbar |
≤ 7 × 10-6 |
|
|
Film Winding |
? |
50 ~ 200 |
||
|
Tension range |
N |
70 ~ 300N |
||
|
Thickness uniformity |
nm |
±5%, @20nm |
NbOx layer |
|
|
Thickness uniformity |
nm |
±5%, @20nm |
SiO2 layer |
|
|
Resistance uniformity |
Ohm/sqr |
150ohm/sqr ±5% |
＜ 40nm |
|
|
Unwinder Chamber |
Base Pressure |
mbar |
≤ 7 × 10-6 |
|
|
Film Winding |
? |
50 ~ 200 |
||
|
Tension range |
N |
70 ~ 300N |
||
|
Max. roll diameter |
mm |
900 |
ITO Resistance
- Uniformity in TD calculated by (TDmax – TDmin) / (TDmax + TDmin)
- Uniformity in MD calculated by (MDmax – MDmin) / (MDmax + MDmin)
* Measurement of 5×5 point in TD and in MD.
◆ Pre-treatment Chamber Concept (前處理設備)
- 薄膜運行距離為20M,充分去除outgassing (remove enough outgassing with film distance of 20M)
- 設置3處加熱系統(tǒng), 薄膜行駛時用溫度加熱快速去除氣體。
( Installing three heating systems, Quickly remove outgassing by heating the temperature when driving the film.)
? Chamber size : 2680 × 2900 × 2700 (L.W.H)
◆. 2Drum Lay-out (參考圖紙)
※. DMS(Dual Cathode) 8set
※. SMS(Single Cathode) 16set
◆. 1Drum Lay-out (參考圖紙)
※. DMS(Dual Cathode) 4set
※. SMS(Single Cathode) 8set
上海羽天實業(yè)有限公司-磁控濺射卷繞式鍍膜機
聯(lián)系人：鄭先生
手機：18321419475
郵箱：18321419475@163.com
地址：上海市松江區(qū)寅青路661號2號樓
